HITACHI REVIEW
Volume 45 Number 1
February 1996
Featured Articles
<Specimen Analysis Using Electron and Ion Beams>
Specimen Analysis Techniques Using Electron and Ion Beams
- Fumio Mizuno, and Yasushi Nakaizumi
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Microscopy and Analysis of Wafer Particles Using a Semiconductor Defect Review System
- Iwao Yamazaki, Tsuneo Akiba, Ryuichirou Tamochi, and Takao Kumada
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Sub-Nanometer Resolution 300-kV Analytical Field-Emission Transmission Electron Microscope
- Hisaya Murakoshi, Mikio Ichihashi, and Hiroshi Kakibayashi
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Elemental Mapping Using an Energy-Filter-Equipped TEM with Application to Magnetic Materials
- Koji Kimoto, Katsuhisa Usami, Yotsuo Yahisa, and Shinji Narishige
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Focused Ion Beam System for TEM Sample Preparation
- Tohru Ishitani, Toshie Yaguchi, and Hidemi Koike
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Dynamic Observation of In-Situ Formation and Sintering of SiC Crystals
- Takeo Kamino, Motohide Ukiana, and Yoshiyuki Yasutomi
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Scanning Electron Microscopy of Food Items Using a Variable-Pressure SEM
- Kenzo Kuboki, and Masao Wada
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Gamma-Type Energy-Filtering Transmission Electron Microscope
- Shunroku Taya, Yoshifumi Taniguchi, Eiko Nakazawa, and Jiro Usukura
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3-MV Ultra-High Voltage Electron Microscope
- Teiji Katsuta, Soichiro Hayashi, and Akio Takaoka
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