‘Best Solutions’ for Production of Leading-edge Semiconductor Devices

Preface

Opening Up New Possibilities in Semiconductor Device Fabrication Technologies (PDF format, 58kBytes)

Wasuke Nakano

Featured Articles

e-Manufacturing System for Next-generation Semiconductor Production

Yasutsugu Usami / Isao Kawata / Hideyuki Yamamoto / Hiroyoshi Mori / Motoya Taniguchi, Dr. Eng.

Semiconductor Process and Manufacturing Technologies for 90-nm Process Generation

Takafumi Tokunaga / Katsutaka Kimura / Jun Nakazato / Fumiyuki Kanai

UHF-ECR Plasma Etching System for Gate Electrode Processing

Shinji Kawamura / Naoshi Itabashi / Akitaka Makino / Masamichi Sakaguchi

Hitachi's Slimming System Using Ozone Process Technology

Hiromichi Kawasaki / Sukeyoshi Tsunekawa / Hiroshi Kawakami / Norio Hasegawa

Vertical SiGe Epitaxial Growth System

Yasuo Kunii, Dr. Eng. / Yasuhiro Inokuchi / Akihiro Miyauchi, Dr. Eng.

Advanced Process Control for Semiconductor Thermal Process

Mitsuhiro Matsuda / Toshimitsu Miyata / Masakazu Shimada / Tomoji Watanabe

High-current Ion Implanter for 300-mm SIMOX Wafer Production

Kazuo Mera / Hiroyuki Tomita / Katsumi Tokiguchi, Dr. Eng.

Semiconductor Yield Enhancement Solutions for Next Generation

Yasutsugu Usami / Naoyuki Eguchi / Seiji Isogai

New CD-SEM System for 100-nm Node Process

Osamu Nasu / Katsuhiro Sasada / Mitsuji Ikeda / Makoto Ezumi

In-line Atomic Force Microscope for Semiconductor Process Evaluation

Hirokazu Koyabu / Ken Murayama / Yukio Kembo / Sumio Hosaka, Dr. Eng.

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