| Kenji Watanabe, Dr.Eng. | Application Technology Dept., Semiconductor Process Control Systems Sales Div., Device Manufacturing Systems Business Gr., |
| Aritoshi Sugimoto | Application Technology Dept., Semiconductor Process Control Systems Sales Div., Device Manufacturing Systems Business Gr., |
| Mari Nozoe | Advanced Technologies Development Dept., Solutions LSI Development Center, Central Research Lab., |
Volume production of 90-nm node semiconductor products began in 2003, and research has been already well advanced on products for the next-generation 65-nm technology node. As feature sizes descend further into the deep submicrometer range, it becomes increasingly important for maintaining quality and streamlined production to exploit a range of analytical tools that are tightly integrated as a total system including (1) CD-SEM (critical-dimension scanning electron microscope) and other metrology tools, (2) defect inspection tools, (3) data collection and analysis systems, (4) SEM and TEM (transmission-electron microscope (TEM) analytical tools, and more. Hitachi Group is known for its lineup of eading-edge, high-performance metrology, inspection, and analytical tools for present and future technology nodes, but goes even further in providing inspection and analysis solutions that are tailored to the very diverse needs of individual device manufacturers.
SEM, TEM, inspection-analysis, solution-analysis
