Hitachi Review

Best Solutions Supporting Volume Production of Leading-edge Semiconductor Devices

Volume 52 Number 3 October 2003

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Hitachi Review

Featured Articles

Outlook for Advanced Semiconductor Process and Manufacturing Technologies (PDF format, 136kBytes)
Takahiro Onai, Dr.Eng. / Shinichiro Kimura, Dr.Eng. / Kazuyuki Suko / Hiroshi Miyazaki, Dr.Eng. / Fumiko Yano, Dr.Eng.
Inspection-analysis Solutions for High-quality and High-efficiency Semiconductor Device Manufacturing
Kenji Watanabe, Dr. Eng. / Aritoshi Sugimoto / Mari Nozoe
New Semiconductor Device Evaluation System for Failure Analysis of Sub-nanometer Areas
Takeo Kamino / Tsuyoshi Onishi / Kaoru Umemura / Kyoichiro Asayama / Kazutoshi Kaji
CD-SEM for 65-nm Process Node
Hiroki Kawada / Hidetoshi Morokuma / Sho Takami / Mari Nozoe
New DUV Optical Wafer Inspection System
Atsushi Shiozaki / Masahiro Watanabe / Takayuki Ono / Masayuki Kuwabara
High-sensitivity, High-speed, Dark-field Wafer-inspection System
Tetsuya Watanabe / Takahiro Jingu / Minori Noguchi / Takuro Hosoe
Application of Electron-beam Direct-writing Technology to System-LSI Manufacturing
Genya Matsuoka / Tsutomu Tawa
Plasma Oxidation and Nitridation System for 90- to 65-nm Node Processes
Unryu Ogawa, Dr. Eng. / Kazuhiro Shimeno / Noriyoshi Sato, Dr. Eng. / Ryoichi Furukawa
UHF-ECR Plasma Etching System for Dielectric Films of Next-generation Semiconductor Devices
Katsuya Watanabe / Kenetsu Yokogawa / Yutaka Omoto / Hiroyuki Makino
e-diagnostics Technology for Supporting e-manufacturing
Shigeyasu Sako / Hideyuki Yamamoto / Hideaki Kondo / Juntaro Arima
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