| Mari Nozoe | Application Technology Center, Research and Development Div., Nanotechnology Products Business Gr., |
| Hiroyuki Shinada | Advanced Technology Research Dept., Central Research Lab., |
| Taku Ninomiya | EB Inspection System Design Dept., Naka Div., Nanotechnology Products Business Gr., |
| Seiji Isogai | EB Inspection System Design Dept., Naka Div., Nanotechnology Products Business Gr., |
| Yoji Ichiyasu | Marketing & Strategy Dept., Semiconductor Process Control Systems Div., Device Manufacturing Systems Business Gr., |
The mass-production of a 90-nm node device and the development of a 65-nm node device were started in earnest in 2004. The manufacturing technology will be needed during the development of advanced devices to control and optimize the process condition and parameters by using the electrical characteristics during the development of advanced devices. Hitachi Group proposes inspection and analysis solution, ones that focus on in-line electrical characteristics monitoring. This solution consists of advanced inspection and analysis tools and application technology.
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Hitachi High-Technologies Coporation |
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ISSM INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING |
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SPIE The International Society for Optical Engineering |
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The Hitachi Hyoron (Japanese Only) |
inspection, analysis, electrical failure, semiconductor device, SEM
