Authors

Takeshi Sato, Dr. Sci.
Naka Application Center, Naka Div., Nanotechnology Products Business Group, Hitachi High-Technologies Corporation

Hiroaki Matsumoto
Naka Application Center, Naka Div., Nanotechnology Products Business Group, Hitachi High-Technologies Corporation

Mitsuru Konno
Naka Application Center, Naka Div., Nanotechnology Products Business Group, Hitachi High-Technologies Corporation

Yoshifumi Taniguchi, Dr. Eng.
Advanced Microscope Systems Design Second Dept., Naka Div., Nanotechnology Products Business Group, Hitachi High-Technologies Corporation

Shuichi Mamishin
Advanced Microscope Systems Design Second Dept., Naka Div., Nanotechnology Products Business Group, Hitachi High-Technologies Corporation

Overview

A 300-kV cold FE-TEM, the HF-3300, has been developed by Hitachi High-Technologies Corporation. This TEM has next-generation analytical capabilities and a cold field emission electron source. Available for this TEM is a cold FE gun for higher brightness and added coherency. Functions of cold FE allow for different types of analysis in various fields through the use of unique technologies. As a result, this TEM can meet demands for the advanced analyses for use in developing semiconductor devices, in failure analysis, and process reaction under the material boundary. The HF-3300 TEM will also be useful for various areas of analysis in physical science.