| Hiroki Kawada | Electronics Systems Design Dept. 1, Naka Div., |
| Hidetoshi Morokuma | Electronics Systems Design Dept. 1, Naka Div., |
| Sho Takami | Electronics Systems Design Dept. 1, Naka Div., |
| Mari Nozoe | Advanced Technology Dept., Central Research Lab., |
Inspection equipment for 90-nm and subsequent process nodes is required to have not only improved observation ability, but also further improved measurement reproducibility as well. In addition, there has arisen an increasing need for new functions for the ArF resist process, which came into use along with miniaturization, process monitoring, etc. To cope with these processes, the S-9360 CD-SEM (critical-dimension scanning electron microscope) developed by Hitachi Group features (1) superior observation ability due to the use of the same electron-optical system as that of the S-9000 series, (2) improved basic performance such as measurement repeatability and throughput, (3) functions that support new processes including measurement of ArF type resist and measurement of surface charged specimens, (4) complete process variation monitoring functions, and (5) functions that support maintenance management of equipment performance, thus providing a measurement environment that is suitable for semiconductor manufacturing processes in the future generation.
CD-SEM, ArF, process, low-k, precision
