| Genya Matsuoka | EB Lithography Systems Sales Dept., Device Manufacturing Systems Business Gr., |
| Tsutomu Tawa | Electronics Systems Design Dept. 2, Naka Div., |
EB (electron-beam) direct-writing lithography has not only been used for semiconductor research and development but has also been applied to small-volume fabrication of custom LSI (large-scale integration) chips. The present paper first describes the EB direct-writing lithography system that has been developed and put on the market by Hitachi High-Technologies Corporation. It then describes an example application of the system to fabrication of silicon devices. Lastly, it outlines the current status and future developments concerning direct writing with the developed EB lithography system.
EBDW, maskless, EB lithography
