| Isao Kawata | Product Marketing Dept., Semiconductor Process Control Systems Div., Semiconductor Equipment Business Gr., |
| Norio Hasegawa | Marketing Dept., Marketing & Planning Div., Semiconductor Equipment Business Gr., |
| Daisuke Hibino | Product Marketing Dept., Semiconductor Process Control Systems Div., Semiconductor Equipment Business Gr., |
| Sho Takami | Metrology Systems Design Dept., Naka Div., Nanotechnology Products Business Gr., |
In next-generation optical exposure technology, a liquid immersion technique is employed to enable the use of hyper-NA optical systems in which the lens has an NA of more than 1.0. The use of techniques such as resolution enhancement implementing low-k1, OPC and double patterning has also made it possible to achieve the utmost resolution, but to ensure that patterns are formed stably it is essential to address the issues of reduced focal depth and process tolerance. In measuring techniques, to adapt to these advanced techniques it is necessary to achieve higher measurement accuracy and improved rendering of 3D profiles. The latest CG4000 CD-SEM equipment is a next-generation CD-SEM adapted to these market trends. Furthermore, the DesignGauge design data utilization system supports the improved precision of OPC models required by next-generation exposure techniques, and is compatible with the trend for rapid growth in the number of measurement points.
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Metrology |
immersion lithography, hyper-NA, process window, DFM, CD-SEM
