| Toru Kurenuma | Design Dept. 2, Development & Production Div., |
| Yukio Kembo | |
| Takafumi Morimoto | Design Dept. 2, Development & Production Div., |
| Masahiro Watanabe | Production Engineering Research Lab., |
Despite the continuing miniaturization and diversification of LSIs, producing a competitive LSI still requires in-line metrological control of minute structures. Beyond the 45 nm node, LSI fabrication requires atomic-level control. Consequently, an AFM capable of measurements at the atomic level is an essential requirement. However, although conventional AFMs can perform measurements, they have been inadequate for in-line use due to their low throughput, difficulty of operation and lack of precision. To address the measurement requirements beyond the 45 nm node, Hitachi Group has developed the WA3300 in-line AFM which combines high throughput with high measurement precision, and a wear-resistant ultra-fine CNT probe tip for use in this equipment.
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Hitachi Kenki FineTech Co., Ltd. |
AFM, CMP, STI, carbon nanotube, step-in
