HITACHI : The Challenge to New Metrology World by CD-SEM and Design

Volume 57 Number 3 June 2008

AUTHORS

Shunsuke Koshihara	Naka Div., Naka Application Center Metrology Group, Hitachi High-Technologies Corporation
Yoshihiro Ota	Naka Div., Naka Application Center Metrology Group, Hitachi High-Technologies Corporation
Hideo Sakai	Metrology Product Marketing Dept., Semiconductor Process Control Systems Div., Semiconductor Equipment Business Group, Hitachi High-Technologies Corporation
Ryoichi Matsuoka	Naka Div., Metrology Systems Design Dept., Hitachi High-Technologies Corporation

OVERVIEW

In the case of semiconductor processes, whose refinement continues at an ever faster pace, starting up a new process smoothly has become a critical point directly related to the very survival of a business. To refine a semiconductor process, semiconductor manufacturers are implementing various measures, one of which is "aggressive OPC." For timely execution of calibration and verification by aggressive OPC, it is necessary to use a data flow that is dissimilar to that used in rule-based OPC up till now. Playing a key role in this new flow is "DesignGauge" featured in Hitachi's design-based metrology system. Furthermore, using DesignGauge makes it possible to provide contour data extracted by the algorithms used in CD-SEM and measurement methods hitherto not available.

TO READ THIS ARTICLE

See PDF file for details(PDFformat, r2008_03_103.pdf, 118KB)

CONTACT FOR INQUIRY

Metrology Product Marketing Department,
Semiconductor System Division,
Hitachi High-Technologies Corporation
TEL: +81-3-3504-5593
FAX: +81-3-3504-5965

RELEVANT SITES

	Metrology
	DesignGauge (Japanese Only)

KEYWORDS

design based metrology, contour, CD-SEM, hyper NA, agressive OPC

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