Shunsuke Koshihara
Naka Div., Naka Application Center Metrology Group, Hitachi High-Technologies Corporation
Yoshihiro Ota
Naka Div., Naka Application Center Metrology Group, Hitachi High-Technologies Corporation
Hideo Sakai
Metrology Product Marketing Dept., Semiconductor Process Control Systems Div., Semiconductor Equipment Business Group, Hitachi High-Technologies Corporation
Ryoichi Matsuoka
Naka Div., Metrology Systems Design Dept., Hitachi High-Technologies Corporation
In the case of semiconductor processes, whose refinement continues at an ever faster pace, starting up a new process smoothly has become a critical point directly related to the very survival of a business. To refine a semiconductor process, semiconductor manufacturers are implementing various measures, one of which is "aggressive OPC." For timely execution of calibration and verification by aggressive OPC, it is necessary to use a data flow that is dissimilar to that used in rule-based OPC up till now. Playing a key role in this new flow is "DesignGauge" featured in Hitachi's design-based metrology system. Furthermore, using DesignGauge makes it possible to provide contour data extracted by the algorithms used in CD-SEM and measurement methods hitherto not available.
Metrology Product Marketing Department,
Semiconductor System Division,
Hitachi High-Technologies Corporation
TEL: +81-3-3504-5593
FAX: +81-3-3504-5965
design based metrology, contour, CD-SEM, hyper NA, agressive OPC
