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    Techniques for measuring thin films and surfaces have become an essential part of the technology underpinning our way of life in recent years. Examples include a wide variety of thin films now in use, such as the advanced films used in smartphones or the electrolyte membranes used in fuel cells, and controlling the surface roughness of pistons used in engines to improve their fuel economy. Hitachi High-Tech Science has released the VS1000 series CSI, extending its range of models that provide solutions for these types of surface analysis. CSI can be used to perform three-dimensional measurement of surface profiles, surface roughness, and film thickness. Measurements can be performed in just a few seconds and provide high vertical resolution (0.01 nm) over a wide measurement range (several millimeters). Another feature is that they can perform non-contact and non-destructive measurement of thickness and cross-sections of multi-layer transparent film, and detect the presence of contaminants in the film, peeling, or other defects.

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    ABOUT THE AUTHORS

    Yugo Onoda, Ph.D.

    Analytical Instruments Design Group 2, Analytical Instruments Design Department, Hitachi High-Tech Science Corporation. He is currently engaged in the development of a CSI. Dr. Onoda is a member of the Japan Society of Applied Physics (JSAP).

    Kiyotaka Ishibashi

    Sales Section 4, Analytical Instrument Systems Sales & Marketing Department, Sales Division, Hitachi High-Tech Science Corporation. He is currently engaged in the sales and marketing of a CSI.

    Kaori Yanagawa

    Application Engineering Section Tokyo 2, Hitachi High-Tech Science Corporation. She is currently engaged in the application development of a CSI.

    Yoshihiro Sato

    Software Systems Design Group, Instruments Design Development Department, Hitachi High-Tech Science Corporation. He is currently engaged in the management and development of a CSI.

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